US Patent No. 9,968,542 B2;  Shiseido Company Ltd., Tokyo, has patented a makeup method that is comprised of applying a makeup base to skin, applying a makeup cosmetic over the makeup base, and removing the makeup cosmetic together with the makeup base, by rubbing the skin with warm water (38-45°C) to remove the makeup cosmetic and the makeup base. The makeup base is comprised of a water-containing aqueous phase as a continuous phase. The water-containing aqueous phase contains vinyl acetat...